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Paper announcement – Atomic layer deposition to prevent metal transfer from implants: an X-Ray Fluorescence study

Paper announcement – Atomic layer deposition to prevent metal transfer from implants: an X-Ray Fluorescence study

The paper “Atomic layer deposition to prevent metal transfer from implants: an X-Ray Fluorescence study” (doi: 10.1016/j.apsusc.2015.09.248, available online since 3 October 2015) is the result of collaboration with University of Brescia (Dr. Fabjola Bilo, Dr. Laura Borgese and Prof. Laura E. Depero). Micro-X-ray fluorescence analysis was performed on micro-XRF spectrometer at Atominstitut.